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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses Guilei Wang 2019 edition
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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses
Guilei Wang
115 pages, 40 Tables, color; XVI, 115 p.
| Medios de comunicación | Libros Paperback Book (Libro con tapa blanda y lomo encolado) |
| Publicado | 2 de octubre de 2020 |
| ISBN13 | 9789811500480 |
| Editores | Springer Verlag, Singapore |
| Páginas | 115 |
| Dimensiones | 150 × 220 × 10 mm · 215 g |
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