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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses Guilei Wang 2019 edition
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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses
Guilei Wang
115 pages, 40 Tables, color; XVI, 115 p.
| Medios de comunicación | Libros Hardcover Book (Libro con lomo y cubierta duros) |
| Publicado | 2 de octubre de 2019 |
| ISBN13 | 9789811500459 |
| Editores | Springer Verlag, Singapore |
| Páginas | 115 |
| Dimensiones | 150 × 220 × 20 mm · 454 g |
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