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Recent Advances in PMOS Negative Bias Temperature Instability: Characterization and Modeling of Device Architecture, Material and Process Impact 2022 edition
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Recent Advances in PMOS Negative Bias Temperature Instability: Characterization and Modeling of Device Architecture, Material and Process Impact
311 pages, 189 Illustrations, color; 24 Illustrations, black and white; XXIII, 311 p. 213 illus., 18
| Medios de comunicación | Libros Hardcover Book (Libro con lomo y cubierta duros) |
| Publicado | 26 de noviembre de 2021 |
| ISBN13 | 9789811661198 |
| Editores | Springer Verlag, Singapore |
| Páginas | 311 |
| Dimensiones | 150 × 220 × 20 mm · 670 g |
| Editor | Mahapatra, Souvik |
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