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Chemical-Mechanical Planarization of Semiconductor Materials - Springer Series in Materials Science Michael R Oliver 2004 edition
Chemical-Mechanical Planarization of Semiconductor Materials - Springer Series in Materials Science
Michael R Oliver
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
428 pages, biography
| Medios de comunicación | Libros Hardcover Book (Libro con lomo y cubierta duros) |
| Publicado | 26 de enero de 2004 |
| ISBN13 | 9783540431817 |
| Editores | Springer-Verlag Berlin and Heidelberg Gm |
| Páginas | 428 |
| Dimensiones | 155 × 235 × 26 mm · 793 g |
| Lengua | Francés |
| Editor | Oliver, M.R. |