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GaP Heteroepitaxy on Si (100): Benchmarking Surface Signals when Growing GaP on Si in CVD Ambients - Springer Theses Henning Doescher 2013 edition
GaP Heteroepitaxy on Si (100): Benchmarking Surface Signals when Growing GaP on Si in CVD Ambients - Springer Theses
Henning Doescher
Epitaxial integration of III-V semiconductors on silicon substrates has been desired over decades for high application potential in microelectronics, photovoltaics, and beyond. The hydrogen-based process ambient enables the preparation of anomalous double-layer step structures on Si(100), highly beneficial for subsequent III-V integration.
157 pages, 47 black & white illustrations, 33 colour illustrations, biography
| Medios de comunicación | Libros Hardcover Book (Libro con lomo y cubierta duros) |
| Publicado | 11 de diciembre de 2013 |
| ISBN13 | 9783319028798 |
| Editores | Springer International Publishing AG |
| Páginas | 143 |
| Dimensiones | 155 × 235 × 13 mm · 362 g |
| Lengua | Inglés |