Recomienda este artículo a tus amigos:
High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1.º edición
Precio
$ 174,49
sin IVA
Pedido desde almacén remoto
Entrega prevista 17 de jun. - 6 de jul.
Nuestros clientes opinan:
Añadir a tu lista de deseos de iMusic
High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs)
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).
246 pages, 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
| Medios de comunicación | Libros Hardcover Book (Libro con lomo y cubierta duros) |
| Publicado | 18 de diciembre de 2020 |
| ISBN13 | 9781771888431 |
| Editores | Apple Academic Press Inc. |
| Páginas | 264 |
| Dimensiones | 150 × 220 × 20 mm · 650 g |
| Lengua | Inglés |
| Editor | Baishya, Srimanta (National Institute of Technology, India) |
| Editor | Maity, Reshmi (Mizoram University, India) |
| Editor | Pratap Maity, Niladri (Mizoram University, India) |
