Recomienda este artículo a tus amigos:
Plasma Processing for Semiconductor Materials and Thin-Film Devices - Vacuum and Thin-Film Deposition Technologies
Nuestros clientes opinan:
Plasma Processing for Semiconductor Materials and Thin-Film Devices - Vacuum and Thin-Film Deposition Technologies
Plasma Processing for Semiconductor Materials and Thin-Film Devices covers the state-of-the-art in plasma processing of thin films. The book focuses on fundamental plasma theory, plasma for advanced applications, advanced characterization techniques, plasma and performance in semiconductor devices, and plasma processing. Sections consider the fundamental physics of plasma then move to advanced applications in the processing of semiconductor materials and their relation to the performance of semiconductor thin film devices.
Subsequently, the book investigates the adoption of plasma for advanced (including thin film) characterization methods, finally addressing emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and advanced plasma techniques. This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.
| Medios de comunicación | Libros Paperback Book (Libro con tapa blanda y lomo encolado) |
| Pendiente de lanzamiento | 1 de diciembre de 2026 |
| ISBN13 | 9780443277412 |
| Editores | Elsevier - Health Sciences Division |
| Páginas | 900 |
| Dimensiones | 150 × 220 × 10 mm · 450 g |
| Editor | Akhavan, Behnam (Associate Professor, School of Biomedical Engineering, University of Newcastle, Australia) |
| Editor | Chen, Sheng-Chi (Professor, Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan) |
| Editor | Cheong, Kuan Yew (Professor, School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia) |
| Editor | Hsiao, Shih-Nan (Professor, Center for Low-temperature Plasma Sciences, Nagoya University, Japan) |
| Editor | Le, Phuoc Huu (Associate Professor, Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan) |
